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Silicon Photonics Highlighted at APS March Meeting

The following press conferences will take place during the March Meeting of the American Physical Society (APS), to be held March 15-19, 2010 in the Portland Convention Center. Journalists are invited to attend the meeting free of charge. Registration information can be found at the end of this release.

18 Mar 2010

MODE Solutions 4.0 for Optical Interconnects and Silicon Photonics Applications

Lumerical Solutions, Inc., a leading provider of nanophotonic design software, today announced the immediate availability of MODE Solutions Release 4.0.

12 Mar 2010

Using Graphene in OLEDs will Reduce Production Costs

Researchers at Stanford University have successfully developed a brand new concept of organic lighting-emitting diodes (OLEDs) with a few nanometers of graphene as transparent conductor.

12 Mar 2010

New Atomic Force Microscope for Nanoscience Applications

Veeco Instruments Inc., the leading provider of atomic force microscopy technology to the nanoscience community, announced today the Dimension® Edge™ Atomic Force Microscope (AFM) System for physical and life sciences investigation.

From Veeco 11 Mar 2010

Silicon Nanowires offer an Economically Viable Solution for Trapping Sunlight

Solar cells made from silicon are projected to be a prominent factor in future renewable green energy equations, but so far the promise has far exceeded the reality.

5 Mar 2010

New Nanotechnology Approach Could Help Eliminate Drug Resistance to Cancer Treatment

Huixin He, associate professor, nanoscale chemistry at Rutgers University, Newark, and Tamara Minko, professor at the Rutgers Ernest Mario School of Pharmacy, have developed a nanotechnology approach that potentially could eliminate the problems of side effects and drug resistance in the treatment of cancer. Under traditional chemotherapy, cancer cells, like bacteria, can develop resistance to drug therapy, leading to a relapse of the disease.

26 Feb 2010

D2S's New DFEB Mask Technology Helps Reduce Lithography Cost

D2S™, an emerging design and software company, today announced its new design for e-beam (DFEB) mask technology for the production of advanced optical photomasks with circular and curvilinear shapes. Used in conjunction with currently available e-beam mask writing equipment, D2S DFEB mask technology reduces the write times for masks containing complex or curvilinear features to enable the extension of 193-nm immersion lithography to the 22-nm node and beyond with practical turnaround time.

24 Feb 2010

API Technologies Shuts Down Its Nanotechnology R+D Subsidiary

API Technologies Corp. (OTC Bulletin Board: ATNY) ("API" or the "Company"), a prime contractor in sophisticated electronics, highly engineered systems, secure communications and electronic components and subsystems to the global defense and aerospace industries, today announced that it is closing its nanotechnology research and development subsidiary.

23 Feb 2010

Molecular Imprints Brings Out New Jet and Flash Imprint Lithography Platform for HDD Business

Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, today introduced the NuTera HD7000—its next-generation Jet and Flash™ Imprint Lithography (J-FIL™) platform for the hard disk drive (HDD) industry.

23 Feb 2010

Pioneering Research on Laser Technology May Pave Way for Improved X-Ray Imaging Resolution

For nearly half a century, scientists have been trying to figure out how to build a cost-effective and reasonably sized X-ray laser that could, among other things, provide super high-resolution imaging. And for the past two decades, University of Colorado at Boulder physics professors Margaret Murnane and Henry Kapteyn have been inching closer to that goal.

22 Feb 2010