Trumpf Launches Ultrashort Pulse Lasers that Reduce PV Production Costs

Trumpf has launched a new series of ultrashort pulse lasers that improves the performance of photovoltaic cells and lowers the manufacturing cost. The TruMicro Series 3000 lasers come in 532 and 1064 nm wavelengths and are ideal for P3, P2 and P1 patterning.

The lasers have an enhanced pulse-to-pulse stability that enables it to attain high-quality processing results. They can also be combined with the existing systems because of the sophisticated cooling design. The lasers maximize cell efficiency because of the fine and precise surface structuring.

Trumpf stated that patterning copper indium gallium selenide thin-film cells is difficult for the existing laser processes. By utilizing the TruMicro Series 3000 lasers, the thin-film cells are ablated with very short pulses without heating the process edge zone substantially. This prevents exfoliation, melting, and cracking of the layers.

The Series 5000 picosecond lasers have a 515 nm wavelength to process the photoactive material. They also feature a 1030 nm wavelength to structure molybdenum. To shield the thin-film solar modules against moisture, a width of approximately 10 mm is ablated along the edge of the module and is then covered using laminated film.