Aug 7 2010
Supplier of yield management and process control systems, KLA-Tencor, has expanded the Aleris film metrology tool portfolio by introducing a new Aleris 8330 metrology system. The Aleris 8330 measures the non-critical film’s stress, refractive index and thickness at the 32 nm node.
Aleris 8310
The Aleris 8330 complements the high-sensitivity Aleris 8350 system that is specifically developed to measure the critical films. Both the systems offer a complete metrology solution for measuring various film layers, aiding fabs in maintaining high-yield production and recognizing the process issues.
The Aleris 8330 is integrated with a number of optical technologies such as UVR (ultraviolet reflectometry), PBSE (Broadband Spectroscopic Ellipsometry) and WLR (white light reflectometry) to bring stability and precision during the films’ procese control.
The Aleris 8330 includes an optional StressMapper that offers stress measurement capability to detect process issues. The system is cost-effective and provides 1.85 times higher throughput than the earlier version of film metrology tool.
The recipe sharing in various Aleris metrology tools enables a flexible process control approach for low-and-high-end film applications.