European experts in nanotechnology, optoelectronics and quantum physics have advanced the generation, detection and manipulation of single photons in semiconductors. Their discoveries bring practical single-photon and quantum applications significantly closer.
D2S™, an emerging design and software company, today announced its new design for e-beam (DFEB) mask technology for the production of advanced optical photomasks with circular and curvilinear shapes. Used in conjunction with currently available e-beam mask writing equipment, D2S DFEB mask technology reduces the write times for masks containing complex or curvilinear features to enable the extension of 193-nm immersion lithography to the 22-nm node and beyond with practical turnaround time.
DALSA offers industry-leading manufacturing capability and design support for high voltage CMOS ICs such as drivers for inkjet print heads
SEMATECH has launched a global consortium at the College of Nanoscale Science and Engineering’s (CNSE) Albany NanoTech Complex to develop critical metrology tools for detecting defects in advanced masks needed for extreme ultraviolet lithography (EUVL) – filling an industry need considered too costly for individual companies to develop independently.
Energetiq Technology, Inc., a developer and manufacturer of specialized light sources for advanced technology applications, has announced a solid-state LED Illuminator to its light source product offering for use in semiconductor lithography. The Energetiq LED Illuminator will be introduced at SPIE Advanced Lithography, February 23-24, 2010 in San Jose, CA.
Intersil Corporation (NASDAQ: ISIL), a world leader in the design and manufacture of high-performance analog and mixed-signal semiconductors, will showcase its latest products and technologies for advanced power management at the Applied Power Electronics Conference and Exposition (APEC). Visitors will be able to interact with different live demos and static displays of Intersil products for consumer, industrial, automotive and military-aerospace applications.
Avago Technologies (Nasdaq:AVGO), a leading supplier of analog interface components for communications, industrial, and consumer applications, today announced that it has demonstrated serial 25Gbps SerDes performance in 40nm CMOS technology. This milestone is the latest achievement in Avago’s history of breakthrough ASIC Intellectual Property (IP) performance.
A team of chemists from the University of New Hampshire has synthesized the first-ever stable derivative of nonacene, creating a compound that holds significant promise in the manufacture of flexible organic electronics such as large displays, solar cells and radio frequency identification tags. The team, led by professor of organic chemistry and materials science Glen Miller and including two UNH undergraduates, published their findings in January 2010 in the Journal of the American Chemical Society.
Micron Technology, Inc. (NASDAQ: MU), and Numonyx Holdings B.V. announced today that the companies have signed a definitive agreement under which Micron has agreed to acquire privately held Numonyx in an all-stock transaction valuing Numonyx at approximately $1.27 billion USD.
Scientists of the research group of Prof. Dr. Alfred Meixner and Dr. Dai Zhang from the Institute of Physical and Theoretical Chemistry at the University of Tübingen have developed a near-field microscope that can measure the optical properties of e. g. semiconductor thin films with a spatial resolution and sensitivity long thought unachievable due to fundamental physical laws (diffraction limit). Both the optical spectrum and the topography of a surface can be mapped simultaneously with nanometre precision – a nanometre corresponding to one millionth of a millimetre.
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