Feb 6 2010
Bolstered by indicators predicting market growth for the industry, the lithography community is preparing for its annual gathering at SPIE Advanced Lithography. The meeting will be held 21-25 February in San Jose, Calif.
More than 600 papers on the latest research will be presented in a 6-conference program that covers the full spectrum of lithography technologies. New this year is a conference on EUV lithography that has spun out of an expanding program on alternative lithographic technologies.
Industry leaders from Nikon, Intel, and Silver Lake Partners will open the symposium with plenary talks:
- Kazuo Ushida of Nikon, on the future of optical lithography
- Eric Chen of Silver Lake Partners, former senior vice president of ASML, on investing in technology in the reset economy
- Sam Sivakumar of Intel, on technical and economic challenges facing lithography.
Several panel discussions will provide additional opportunities for the community to work through challenges posed by the semiconductor industry. This year's moderators and topics are:
- "Self-assembling molecules for semiconductor patterning and nanoelectronics," moderated by Richard Silver and Christopher Soles, NIST (National Institute of Standards and Technology); sponsored by Molecular Imprints
- "EUV source $10M. EUV scanner $100M. Defect-free EUV photomask, priceless! For some there's NIL, for everyone else, there's EUV," moderated by Bryan Kasprowicz of Photronics, Inc., and Franklin Kalk of Toppan Photomasks, Inc; BACUS Technical Group
- "New metrology in the present economy"; part of Metrology, Inspection, and Process Control for Microlithography Conf. 7638
- "The trial of EUV and DPT ArF for the 22nm ½-pitch node," moderated by Nigel Farrar of Cymer, Will Conley of Freescale Semiconductor, and Bruno La Fontaine of Global Foundries
- "Strategies for increasing the value of metrology and inspection," moderated by George Orji and Ronald Dixson of NIST; sponsored by NIST
- "Role of reference metrology in nanotechnology progress," moderated by Vladimir Ukraintsev of Nanometrology International; part of Metrology, Inspection, and Process Control for Microlithography Conf. 7638.
A set of 18 courses taught by recognized industry experts will be offered in metrology, resist materials and processing, DPI, CUV, and other lithography topics. This year's program features several all-new courses on the latest approaches and best practices current to the industry.
More than 70 exhibiting companies will show their latest products in a two-day exhibition, and popular poster receptions and other events will provide additional networking opportunities.
The vital role of laser technology in lithography will be celebrated in a multimedia exhibit marking the 50th anniversary of the first successful demonstration of the laser. SPIE is celebrating the laser anniversary in 2010 through the Advancing the Laser tribute to those who have advanced the technology, and as a Founding Partner and Sponsor of LaserFest, a collaborative celebration of the science community.
Advanced Lithography Symposium Chair is Christopher Progler, Photronics, Inc., and Symposium Cochair is Donis Flagello, Nikon Research Corp. of America.
Conference proceedings are published in the SPIE Digital Library individually as soon as approved after the meeting, and also in collected print and digital volumes.