Jan 21 2010
Oclaro, Inc. (Nasdaq: OCLR), a leading provider of optical components for industrial applications, will be showcasing a new 80 Watt 20% fill-factor bar and 50 W 18%FF "half-bar" at the Photonics West trade show in San Francisco, CA.
These new conductively cooled laser diode bars deliver very-high brightness in the 9xx nm to 10xx nm range, simplifying the design and reducing the overall costs for equipment in multi-kilowatt high brightness direct diode applications, fiber laser pumping, medical and industrial manufacturing applications.
"Oclaro continues to lead the industry on brightness and power due to our exceptional design and a deep understanding of the systems-level," said Yves LeMaitre, Executive VP and Division Manager for Oclaro. "By offering an unparalleled combination of brightness, high-power and cost-savings in our laser diode bars, we believe our customers will deliver a new generation of advanced direct diode systems, fiber laser pumps and medical products."
Leveraging Oclaro's unique expertise in epitaxial design and mounting technology, the company was able to reduce the filling factor of the 80 W bar from 30% to 20%, while maintaining the output power of 80 W and increasing the brightness by 50%. The 50 W "half-bar" delivers even greater brightness and due to the reduced bar width, can offer much smaller smile values well below 1um. Both products are conductively cooled mounted with hard solder on a CS-type assembly.
These new high brightness laser diode bars allow manufacturers to couple the diodes to smaller fibers, and work with less stringent tolerances for alignment of their beam shaping optics. The diode bars reduce fiber-coupling losses by enabling smaller spot sizes, which increases overall efficiency and has a positive impact on cooling requirements for fiber couplers and system. As a consequence, system complexity is minimized and system cost is decreased as customers are able to create smaller and more compact systems that leverage industry standard components and automated processes.