Feb 10 2011
Developer of LED and solar panels, Veeco Instruments has rolled out a new Metal Organic Chemical Vapor Deposition (MOCVD) Multi-Reactor System for producing high-brightness light-emitting diodes (HB LEDs).
The TurboDisc MaxBright Gallium Nitride MOCVD system utilizes the company’s Uniform FlowFlange technology and automation experience by integrating MOCVD reactors in a four- or two-reactor cluster architecture.
MaxBright GaN MOCVD System
The MaxBright solution features thermal control technology and has expanded wafer capacity. The unit attains 25% more throughput, when compared to the K465i solution. It also features various advantages such as material quality, repeatability, and uniformity. The MOCVD system provides maximum wafer capacity of 12 x 8”, 24 x 6”, 56 x 4”, or 216 x 2” wafers.
Veeco’s CEO, John R. Peeler stated that the company has enhanced the product development programs and MOCVD technology investment to decrease the LED manufacturing costs. Peeler added that the MaxBright MOCVD solution has the ability to quicken the transition to LED lighting.
Veeco is currently shipping the MaxBright MOCVD solution for various manufacturers in China, Taiwan, and Korea.