SUSS MicroTec Unveils MA100e Gen2 Lithography System for HB-LED Production

Provider of devices for the semiconductor industry, SUSS MicroTec has unveiled the upgraded MA100e mask aligner for developing high-brightness light emitting diodes (HB-LEDs).

The MA100e is based on the company’s mask aligner design and processes wafers with a maximum length of four inches. It allows a throughput of 145 wafers for every hour with decreased cycle times.

SUSS MicroTec, by developing the MA100e Gen2 mask aligner, has designed an automatic mask aligner solution to meet the LED industry’s cost-sensitive technology needs. Pre-alignment options and high intensity exposure optics lessen the process time, whereas functionalities such as proximity exposure for high resolution enhance cost-efficiency and yield. The MA100e Gen2 mask aligner offers swift time-to-market. It also provides enhanced process scalability for the latest device designs.

President of SUSS MicroTec, Frank Averdung stated that the upgraded MA100e mask aligner would help customers to enhance production efficacy and decrease the cost per lumen.