Jul 19 2010
Nova Measuring Instruments has unveiled the next generation NovaMARS optical CD development tool for the semiconductor manufacturers. The NovaMARS 4.0 tool helps semiconductor manufacturers, who develop 22nm and below technology and need to view complex 3D structures by precise and non-destructive metrology.
Nova T500 Optical CD Tool
The NovaMARS 4.0 measures with greater sensitivity and accuracy; and delivers greater 3D structure details. The product, deployed on the Nova T500 optical CD tool, showed a decrease of more than 50 times in library calculation time. It also generated over 100 times smaller library sizes on applications such as Copper interconnect lines, Flash bit-lines, and logic FinFET.
The device uses a small library design that facilitates measuring more parameters and decreases the size of the library by magnitude. The new Microsoft Windows HPC powered high-power computing architecture offers multiple user management, and flawless computing power distribution. The device has a new interpretation algorithm that raises the sensitivity by increasing the spectral information obtained during measurement.
The Chief Technology Officer of Nova, Boaz Brill, said that NovaMARS is the first to launch complete 3D modeling capabilities. He noted that the fourth generation NovaMARS 4.0 application development tool is the fastest till date to extract information from the 3D structure.