MKS Announces Ophir® Pulse Energy Sensor with Highest Damage Threshold for Concentrated Laser Beams

MKS Instruments, Inc. a global provider of technologies that enable advanced processes and improve productivity, has announced the Ophir^® PE50U-DIFH-C Pulse Energy Sensor at SPIE Photonics West 2020. Designed for use with high power pulsed lasers operating in demanding conditions, the sensor features special materials that can measure UV radiation down to 193 nm, high repetition rates up to 10 KHz, and high energy densities up to 1 J/cm² at 193 nm and 2 J/cm² above 240 nm.

Ideal for use in medical, semiconductor, and scientific research applications, the PE50U-DIFH-C energy sensor operates over a wide range of wavelengths, power levels, and repetition rates. It is calibrated at 193 nm, 248 nm, 355 nm, 532 nm, 1064 nm, 2100 nm, and 2940 nm to ensure the highest levels of accuracy. It has a 35 mm aperture and can measure energies from 10 µJ to 10 J. A special diffuser delivers the highest energy density damage threshold available, up to 90 J/cm² for ms pulses.

The PE50U-DIFH-C pulse energy sensor features a "Smart Connector" interface that operates with any of Ophir's smart displays, including the Centauri, StarBright, Vega, Nova II, and StarLite, as well as the company's PC interfaces.