Nova Measuring Instruments has launched its new optical critical dimension (Optical CD) metrology system called Nova T600 to control the processes of sophisticated vertical architectures for the 22 nm technology node and further.
During its assessments with major foundry and memory customers, Nova T600 illustrated considerable process enhancements, including 4 fold more measurement sensitivity on the sophisticated three-dimensional applications’ key profile attributes.
Nova T600
Optical CD is the ideal system to measure and control the more sophisticated three-dimensional structures, including buried-gate DRAM, stacked NAND and FinFET. The latest Nova T600 has a multi-channel reflectometry called oblique incidence spectroscopic reflectometry as well as a normal-incidence reflectometer. The combination offers superior sensitivity on tiny aspects, including below high-aspect-ratio structures.
The Nova T600 extracts superior signal-to-noise, making it to perform better on the complete scope of metrology applications. The upcoming version of the NovaMARS application development software features unique algorithms to enhance the accuracy of measurements. The system in combination with NovaMARS completely supports the simultaneous maximization of data from several sources, a Holistic Metrology Approach model launched by Nova.
The Nova T600 is developed to fulfill the cost of production demands of the semiconductor companies. The system fulfills the requirements via modular metrology, superior TPT and the options to enhance tool version and optical pattern based on the requirements of the applications. It is compatible with the complete frame low vibration T-platform, which can be setup to endorse manifold metrology units and load ports.