Optics Balzers Jena provides the SWIR spectral region with all-dielectric band-pass standard filters having an exceptional automatic blocking filter design. A wide blocking range is integrated with a high pass-band transmittance in one all-dielectric interference coating.
The filters are deposited by plasma-assisted sputter and evaporation processes, which can be observed within and are stable in space and terrestrial atmospheres. The company also offers suitable broad-band dichroic beam-splitters.
High transmittance band-pass filters are required by short-wave infrared (SWIR) optical sensing applications for spectral region between 900 and 3000 nm . Within the Indium Gallium Arsenide (InGaAs) detectors and Mercury Cadmium Telluride (MCT)’s sensitivity regions, radiation blocking by the filter can be provided by an individual all-dielectric multilayer system. The interference of multiple reflections in the filter substrate is restrained by the self-blocking filter design, with blocking and band-pass on the substrate’s side. The deep-cooled detector array assemblies result, with inappropriate cemented components and color glasses.
Optics Balzers Jena provides a range of plasma- assisted coating technologies. The optical properties of all-dielectric coatings following the vacuum process are retained even under varied ambient conditions, able to survive under temperatures ranging from -100 to 300°C.
During the manufacture of SWIR filters, in order to check the layer characteristics optically during deposition, broad-band spectra photometric thickness is used for monitoring. The company even offers suitable broad-band dichroic beam-splitters in order to separate the SWIR detection band from other visible and near-infrared (VNIR) receiving channels.
The company now supplies filter and beam-splitter components for the multi-spectral instrument for a division of Europe's Global Monitoring for the Environment and Security (GMES) program called the EADS Astrium’s Sentinel-2 mission.
Optics Balzers range of products will be exhibited from January 21 to 26, 2012 at BiOS and Photonics West in San Francisco, California, USA