Mar 9 2010
Vistec Lithography, Inc. announced today that Yale University, New Haven, Connecticut, selected Vistec’s EBPG5000plus electron-beam lithography system for its future nanotechnology research programs.
As part of the Yale Institute for Nanoscience and Quantum Engineering, it will enhance the effectiveness of research and education at Yale in emerging nanotechnology and will encourage multidisciplinary research involving Yale faculty, its students, and associated world-wide research partners.
The Yale EBPG5000plus represents the continued development of the highly successful EBPG product series. The high performance lithography system is based on reliable and well-proven system architecture. With further enhancements in resolution, noise reduction and beam stability, Yale’s Vistec EBPG5000plus is set to generate structures to less than 8nm on substrates up to 150mm in diameter, including fragments and special substrates. Its electron-optical column (TFE source) is rated for acceleration voltages of 20, 50, and 100kV. The system is equipped for true 100kV / 1mm performance under regular electron-optical conditions with a wide current capability for high throughput applications. The pattern generator operates at up to 50MHz. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, university type environments.
“The acquisition of the Vistec EBPG5000plus will enable the Yale research community to explore the expanding field of nanotechnology with a state-of-the-art electron-beam lithography patterning system. We will utilize the system for a wide variety of applications including Applied Physics, Electrical Engineering and Bio-technology. The Vistec system will allow Yale to remain at the forefront of nanotechnology today and well into the future”, said Dr. Michael Rooks, Facilities Director of the Yale Institute for Nanoscience and Quantum Engineering. “The EBPG system will provide the Yale community with not only high quality nanolithography patterning, but with high flexibility and user friendliness for our various multidisciplinary activities. Vistec’s system is perfect for our nanotechnology requirements.”
“Vistec is pleased to be associated with Yale University. We look forward to our co-operation with Yale’s leading edge nanotechnology researchers and their programs”, noted Rainer Schmid, General Manager Vistec Lithography, Inc. “Vistec’s association with Yale and its electron-beam research scientists will hopefully lead to further software and hardware enhancements for our highly successful EBPG series.”