Veeco Instruments, a provider of equipment solutions for production of wireless chips, MEMS, hard drives, power electronics and LEDs, has reported the delivery of its TurboDisc K465i MOCVD system to Nantong Tongfang Semiconductor’s new LED Technology Center located in Nantong, China.
Tsingua Tongfang’s subsidiary, Nantong Tongfang will use the TurboDisc K465i MOCVD system for its new research related to the development of GaN-on-Si high brightness LEDs (HB LEDs). The K465i MOCVD system demonstrates low defects and film quality, which are critical aspects for GaN-on-Si processing. It is also equipped with Veeco's Uniform FlowFlange technology to provide remarkable run-to-run repeatability and better uniformity.
The production-proven K465i MOCVD system’s low maintenance TurboDisc technology facilitates high throughput, superior particle performance and better system availability. It offers quick equipment recovery time subsequent to maintenance works, and enables easier tuning for rapid process optimization on wafer sizes of up to 8".
Nantong Tongfang Semiconductor’s General Manager, Professor Liu Gang stated that the company is using Veeco’s MOCVD systems in its ongoing GaN-on-sapphire-based LED production. Based on this success, the company chose Veeco’s TurboDisc K465i MOCVD system for its research on GaN-on-Si based LED devices, which will become the company’s focus of research and development investment for the coming few years.
Veeco’s Senior Vice President, MOCVD, Jeff Hawthorne said that majority of LED customers are now involved in the development of GaN-on-Si technology, which provides the opportunity to spur the widespread usage of solid-state lighting by decreasing production costs of LEDs without sacrificing end-product quality. Hawthorne added that the company is happy to aid Tongfang in its research initiatives.